An automated thin film formation technique is developed using the microcontroller PIC16F877
for NiO film formation at low temperatures for different molarities. Then the formed films were
annealed at 310oC to get better crystalline structure. The Structural and optical properties were
studied for the grown thin films with the developed instrument. The band gap of the formed thin
films is in the range of 3.73 eV to 3.35 eV. The optical studies revealed that the transmittance of
the grown film is upto 80 % and decreases with increase of molarity of the solution. The design
scheme of the developed instrument is also discussed.
