ECR plasma assisted deposition of nano-TiO2 for repeated applications of photocatalytic degradation

By Avinash S Bansode, Chiti M Tank, K R Patil, S V Bhoraskar and V L Mathe

ECR plasma assisted thin film of nano-TiO2 has been deposited on glass substrate. Chemical sputtering is encorporated to immobilize TiO2 nanoparticles. Efforts have been taken to overcome the difficulty of recovery and reuse of the TiO2 nanoparticles for water purification. It is found to be successful to immobilize TiO2 nanoparticles on glass substrate, which shows strong adhesion consequently easy for repeated use for photo catalytic degradation. SEM and AFM images were studied to understand the morphology of the deposited film. XRD and XPS reveal the crystal structure and present species of TiO2 in thin film.

Key words: ECR Plasma, Photodegradation TiO2 thin film, Chemical sputtering.

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